(Nanowerk News) Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes ...
MILPITAS, Calif.--(BUSINESS WIRE)--KLA-Tencor (NASDAQ: KLAC) today released its next-generation in-situ plasma etch wafer temperature measurement product, the EtchTemp SensorWafer™. The newest ...
This is the second blog in a three-part series on pixel-level dose correction (PLDC). The first installment was “Improving Uniformity and Linearity for All Masks” from January 29, 2025. PLDC: A new ...
MILPITAS, USA: KLA-Tencor released its next-generation in-situ plasma etch wafer temperature measurement product, the EtchTemp SensorWafer. This SensorWafer from KLA-Tencor’s SensArray division, ...
Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...
Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes. New impedance ...
A review of Ion Beam technology is presented in this paper. The key applications and benefits of using ion beam technology for etching processes in comparison to technology such as plasma etching will ...
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