What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...

The atomic layer deposition (ALD) of silicon nitride thin films is an advanced technique that utilises sequential, self-limiting reactions to produce high‐quality, conformal coatings with excellent ...

Integrating 2D materials into sustainable electronic devices presents key challenges, particularly in depositing or etching nanometer-thick layers on high aspect ratio structures. Atomic Layer Etching ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...

Laser machining, as one of the most significant micro/nano-manufacturing technologies, shows the capability of achieving ultimate accuracy, feature size and surface integrity at atomic scale. This has ...

A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...

Continuous downscaling of the critical dimensions in semiconductor devices is the cornerstone of technological revolution. As the technology nodes keep shrinking, innovations in fabrication ...

A precise synthesis tunes platinum skin thickness on PtCu nanospheres and shows two atomic layers give the best oxygen reduction performance and durability. (Nanowerk News) Fuel cells still depend on ...